Ion Beam Etching (IBE) and Film Deposition Device (IBD)
We can accommodate everything from special specifications for R&D to mass production! Approximately three times longer lifespan compared to standard grids.
We would like to introduce our "Ion Beam Etching (IBE) and Deposition Equipment (IBD)." We offer a lineup ranging from standard entry models to high-end models capable of precise control over film thickness uniformity and other parameters. We can accommodate special specifications such as glove box attachments for research and development in both corporate and academic settings. Additionally, we support everything from lab-scale R&D to mass production, enabling etching processes for difficult materials and deposition focusing on uniformity and film thickness distribution for various materials equipped with a dual ion gun system. 【Features】 - We can propose models tailored to your performance requirements, from standard entry models to high-end classes capable of precise control over film quality. - We can accommodate special specifications, including glove box connections, for research applications in R&D and academia. - Film thickness uniformity of less than 0.6% (3σ) has been achieved on 200mm wafers. *For more details, please feel free to contact us.
- Company：プラズマ・サーモ・ジャパン
- Price：Other
